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  3. Vol. E90-C, No. 5 May 2007 /
  4. Papers

Study of 30-nm Double-Gate MOSFET with Halo Implantation Technology Using a Two-Dimensional Device Simulator

Authors

  • Tetsuo ENDOH
  • Yuto MOMMA

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Published

2007-05-01

Issue

Vol. E90-C, No. 5 May 2007

Section

Papers

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