Effects of Rapid Thermal Annealing on Bias-Stress-Induced Base Leakage in InGaP/GaAs Collector-Up Heterojunction Bipolar Transistors Fabricated with B Ion Implantation

Authors

  • Kazuhiro MOCHIZUKI
  • Ken-ichi TANAKA
  • Takashi SHIOTA
  • Takafumi TANIGUCHI
  • Hiroyuki UCHIYAMA

Published

2006-07-01

Issue

Section

Papers